Temperature dependences of optical properties,chemical composition,structure,and laser damage in Ta_2O_5 films  

作　　者：许程 杨帅 张生辉 牛继南 强颖怀 刘炯天 李大伟 

机构地区：[1]School of Materials Science and Engineering,China University of Mining and Technology [2]School of Chemical Engineering&Technology,China University of Mining and Technology [3]Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences

出　　处：《Chinese Physics B》2012年第11期297-305,共9页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China (Grant Nos. 61107080 and 50921002);the Natural Science Foundation of Jiangsu Province,China (Grant No. BK2011223);the Specialized Research Fund for the Doctoral Program of Higher Education of China (New Teachers) (Grant No.20110095120018);the China Postdoctoral Science Foundation (Grant No. 20110491472);the Fundamental Research Funds for the Central Universities,China (Grant No. 2012QNA03)

摘　　要：Ta2O5 films are prepared by e-beam evaporation with varied deposition temperatures, annealing temperatures, and annealing times. The effects of temperature on the optical properties, chemical composition, structure, and laser- induced damage threshold （LIDT） are systematically investigated. The results show that the increase of deposition temperature decreases the film transmittance slightly, yet annealing below 923 K is beneficial for the transmittance. The XRD analysis reveals that the film is in the amorphous phase when annealed below 873 K and in thehexagonal phase when annealed at 1073 K. While an interesting near-crystalline phase is found when annealed at 923 K. The LIDT increases with the deposition temperature increasing, whereas it increases firstly and then decreases as the annealing temperature increases. In addition, the increase of the annealing time from 4 h to 12 h is favourable to improving the LIDT, which is mainly due to the improvement of the O/Ta ratio. The highest LIDT film is obtained when annealed at 923 K, owing to the lowest density of defect.Ta2O5 films are prepared by e-beam evaporation with varied deposition temperatures, annealing temperatures, and annealing times. The effects of temperature on the optical properties, chemical composition, structure, and laser- induced damage threshold （LIDT） are systematically investigated. The results show that the increase of deposition temperature decreases the film transmittance slightly, yet annealing below 923 K is beneficial for the transmittance. The XRD analysis reveals that the film is in the amorphous phase when annealed below 873 K and in thehexagonal phase when annealed at 1073 K. While an interesting near-crystalline phase is found when annealed at 923 K. The LIDT increases with the deposition temperature increasing, whereas it increases firstly and then decreases as the annealing temperature increases. In addition, the increase of the annealing time from 4 h to 12 h is favourable to improving the LIDT, which is mainly due to the improvement of the O/Ta ratio. The highest LIDT film is obtained when annealed at 923 K, owing to the lowest density of defect.

关 键 词：Ta2O5 film laser damage DEPOSITION ANNEALING 

分 类 号：O484.1[理学—固体物理]