γ-氨丙基三乙氧基硅烷(APTES)与高岭石层间表面羟基的嫁接反应机理  

The Grafting of γ-aminopropyltriethoxysilane onto the Interlayer Hydroxyls of Kaolinite

作　　者：杨淑勤[1,2] 袁鹏[1] 何宏平[1] 刘冬[1] 覃宗华[1] 朱建喜[1] 

机构地区：[1]中国科学院矿物学与成矿学重点实验室广州地球化学研究所,广东广州510640 [2]中国科学院研究生院,北京100049

出　　处：《矿物学报》2012年第4期468-474,共7页Acta Mineralogica Sinica

基　　金：国家自然科学基金(批准号:U0933003;41102022);中国科学院知识创新工程项目(KZCX2-YW-QN101)

摘　　要：采用γ-氨丙基三乙氧基硅烷(APTES)对不同有序度高岭石的层间表面羟基进行嫁接反应。应用XRD、FTIR、热分析、元素分析等表征手段对产物进行分析。结果表明:高岭石经过二甲基亚砜(DMSO)预插层后,可与APTES反应得到嫁接产物。在相同反应温度下,由于不同有序度高岭石中的DMSO插层分子脱嵌速率不同,导致嫁接产物在嫁接程度上具有明显差异:有序度高,其嫁接程度高;反之,则嫁接程度低。The interactions between γ-aminopropyltriethoxysilane （APTES） and kaolinite with different degree of order were investigated. The samples were characterized by using X-ray diffraction, Fourier transform infrared spectroscopy, thermogravimetric analysis, and elemental analysis. The obtained results suggests that the APTES is grafted onto the interlayer hydroxyls of kaolinite. The diffusion rate of DMSO is faster than the accession rate of APTES in higher-defect kaolinite under the same reaction temperature, leading to different grafted degree.

关 键 词：高岭石 有序度 有机硅烷 嫁接 

分 类 号：P578.964[天文地球—矿物学] P579[天文地球—地质学]