飞秒激光沉积ZnO/Si大面积均匀薄膜及其特性  

Properties of femtosecond laser deposited ZnO large-area uniform films on Si substrates

作　　者：杨义发[1] 江超[1] 

机构地区：[1]湖北师范学院物理与电子科学学院,湖北黄石435002

出　　处：《光电子．激光》2012年第12期2349-2354,共6页Journal of Optoelectronics·Laser

基　　金：湖北省教育厅(B20112501)资助项目

摘　　要：利用飞秒脉冲激光沉积(PLD)法在Si(100)基片上制备大面积均匀的ZnO薄膜,通过激光束、靶材及衬底的运动使得所制备的薄膜均匀性面积大小不受限制。X射线衍射(XRD)结果显示,所制备的薄膜具有典型的六方纤锌矿结构,并沿(002)方向高度择优取向生长。场扫描电子显微镜(FESEM)显示,薄膜是沿垂直于衬底方向生长的六方柱状纳米晶,且膜厚均匀。紫外-可见光谱透射率显示,所制备的薄膜在380nm附近有一陡峭的吸收边,在可见光波段具有90%以上的透过率。光致发光(PL)光谱显示,薄膜在377nm处有一强而窄的紫外发射峰。实验结果表明,所制备的薄膜具有良好的结构及光学性能。Large-area uniform ZnO thin films were prepared on Si （100） substrates using femtosecond pulse laser deposition （PLD） ,and the size of the film was unlimited by moving the laser beam,ZnO target and Si substrate. The X-ray diffraction （XRD） results show that the ZnO films are highly c-axis oriented. The field emission scanning electron microscope （FESEM） indicates that the films have a typical hexagonal structure and uniform thickness. The UV-visible transmissivity shows that the films have a transmittance of 90% in visible range and a sharp absorption edge at 380 nm. The photoluminescence spectra indicate that there is only a strong peak at 377 nm. All results show that the films have a good structure and excellent optical properties.

关 键 词：脉冲激光沉积(PLD) ZNO 扫描半径 光致发光(PL) 

分 类 号：O484[理学—固体物理]