T型微通道内溶胶液滴形成过程  被引量:2

Investigation on droplet formation in T-shaped microchannel

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作  者:高聪[1,2] 漆小波[2] 杨睿戆[2] 苏琳[2] 陈素芬[2] 李波[2] 王丽莉[3] 黄卫星[1] 

机构地区:[1]四川大学化学工程学院,成都610065 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [3]中国工程物理研究院计算机应用研究所,四川绵阳621900

出  处:《强激光与粒子束》2013年第1期71-76,共6页High Power Laser and Particle Beams

基  金:中国工程物理研究院科学技术发展基金项目(2011B0302058)

摘  要:以制备空心玻璃微球的前体溶胶和硅油为原料,采用实验观测和数值模拟的方法,对T型微通道内溶胶乳液形成过程进行研究。基于液滴的受力分析,建立了液滴形成过程的数学模型,探讨了液滴大小的变化规律。研究结果表明:对于给定的物料体系和T型微通道,通过改变两相流量可以有效地控制液滴尺寸;在相同的分散相流量条件下,增大连续相流量可以减小液滴尺寸,但连续相流量大到一定程度后,这种效果逐渐减弱;在给定的连续相流量条件下,分散相流量越大,液滴直径越大;利用数学模型计算出的液滴直径与实验值偏差在10%左右。根据模拟结果和摄像分析,液滴产生过程经历了静态长大和缩颈剥离两个主要阶段。A T-shaped microchannel is efficient for monodispersed droplet formation. In order to get a better understanding, the droplet formation process was investigated by numerical simulation and experiment. Silicon oil and precursory sol for hollow glass microspheres were used as the continuous phase and the dispersed phase respectively. A numerical model of the droplet for- mation was established on the basis of force analysis for a single droplet. Effects of the flow rates on the droplet size were investi- gated. The results show that the droplet diameters can be controlled by adjusting the flow rates of both phases. Droplet diameters decrease with the increase of continuous phase flow rate at a given dispersed phase flow rate. There is a range beyond which the effect of the continuous phase flow rate becomes weak. The droplet diameters increase with the increase of dispersed phase flow rate. Droplet diameters calculated by the numerical model are close to those by experiment with a deviation around 10G. Based on the simulation and the video, the droplet experiences two phases, narnely, the droplet growing under a quasi-steady situation and the stripping. The results help with a better understanding about the droplet formation in a T-shaped microchannel. They also provide good reference for size control of gel microspheres fabricated by sol-microemulsion gel process.

关 键 词:T型微通道 乳液 液滴形成过程 

分 类 号:TL639[核科学技术—核技术及应用] TQ021.1[化学工程]

 

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