光记录用靶材的应用、性能要求和制造方法  

Applications,Performance Requirements and Manufacturing Methods of Optical Recording Target

作　　者：王永明[1] 吕超[1] 夏乾坤[1] 

机构地区：[1]北京有色金属研究总院有研亿金新材料股份有限公司,北京102200

出　　处：《材料导报（纳米与新材料专辑）》2012年第2期229-231,共3页

基　　金：国家863计划项目(2012AA030315)

摘　　要：首先介绍了溅射靶材在光盘的记录层、反射层和保护层中的应用;然后介绍了光盘用靶材在纯度、晶粒和密度等方面的要求;最后通过实例介绍了熔炼和粉末冶金等光盘用靶材的制造方法,认为适当地向靶材中添加新成分已成为改善光盘薄膜性能的重要手段之一。First of all, the applications of sputtering target in recording layer, reflective layer and protective layer of optical disk are described. Then the requirements in purity, grain and density are introduced. Finally, the methods for producing a target, such as melting and powder metallurgy, are exemplified. It is believed that adding a new ingredient has become one of the important means to improve the performance of disc film.

关 键 词：光记录 靶材 相变材料 

分 类 号：TB43[一般工业技术]