三价铬电镀铬的研究  

Technological Investigation of Trivalent Chromium Plating

作　　者：李家柱[1] 毛祖国[2] 丁运虎[2] 李文刚 孙宁 侯蔚 

机构地区：[1]北京蓝丽佳美化工科技中心,北京100096 [2]武汉材料保护研究所,湖北武汉430030 [3]内蒙古第一机械工业集团有限公司,内蒙古包头014032 [4]中国兵器工业新技术推广研究所,北京100089

出　　处：《电镀与精饰》2012年第12期14-17,共4页Plating & Finishing

摘　　要：采用硫酸盐体系和铱钌涂敷钛阳极进行了三价铬电镀工艺的研究,制备的三价铬电镀溶液成分简单,电流效率高,电沉积速度达到2μm/min,可以在15～45℃的温度区间操作,镀层δ达到80μm以上。采用X-射线测厚仪和衍射仪,对镀层的厚度和结构进行了测试。Trivalent chromium plating was carried out by using sulfate system and DSA anode. The thickness and structure of coating were determined by X-ray thickness tester and diffraction instrument. The results show that the trivalent chromium coating has a simple composition, higher current efficiency with the electrodeposition rate of 2 μm/min. The chromium plating could be operated in the temperature range of 15 -45 ℃, and the coating thickness could be reached to 80 μm.

关 键 词：三价铬 电镀 硬铬 X-射线衍射 

分 类 号：TQ153.11[化学工程—电化学工业]