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作 者:刘成虎[1] 华一新[1] 徐存英[1] 李艳[1] 裴启飞[1] 吴振[1]
机构地区:[1]昆明理工大学冶金与能源工程学院,昆明650093
出 处:《中国有色金属学报》2012年第11期3221-3228,共8页The Chinese Journal of Nonferrous Metals
基 金:国家自然科学基金资助项目(50864009)
摘 要:采用电化学方法研究urea-NaCl-ZnCl2-TiCl4离子液体中Ti(Ⅳ)在玻碳电极的阴极还原过程,并应用恒电位沉积考察温度、电位和ZnCl2含量对沉积层的影响。结果表明:阴极反应为准可逆反应,Ti(Ⅳ)可逐步还原为Ti(0);在低碳钢上,Zn和Ti发生诱导共沉积,得到平整的沉积层;适当提高沉积温度和电位可使沉积颗粒细化,镀层表面更加致密平整,但ZnCl2含量的增加对Zn-Ti合金沉积有阻碍作用;当ZnCl2的摩尔分数为10%、温度为80℃、沉积电位为1.5~2.0 V时,得到的镀层平整、致密、光滑,粒径约为0.8μm。The cathode reaction process of Ti(Ⅳ) in urea-NaCl-ZnCl2-TiCl 4 ionic liquid was studied with the electrochemical methods.The electrodeposition was carried out by the controlled potential method.The effects of temperature,potential and ZnCl2 content of ionic liquid on the coating were studied.The results indicate that the cathode reaction is a quasi-reversible reaction and Ti(Ⅳ) can be reduced to Ti(0) through stepwise reduction.The flat and compact deposits on the mild steels are obtained by the induced codeposition of Zn and Ti.Increasing temperature and potential properly is favorable to obtaining the finer and more compact deposits.However,the codeposition is inhibited by the increase of ZnCl 2 content.The coating with crystal size of nearly 0.8 μm is obtained when the mole fraction of ZnCl2 is 10%,the temperature is 80 ℃ and the potential varies from-1.5 to-2V.
关 键 词:Zn-Ti合金 TICL4 NACL urea-ZnCl2 电化学沉积
分 类 号:TG146.4[一般工业技术—材料科学与工程]
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