用CVS分析仪监控酸性电镀铜溶液  

Monitoring acid copper plating solution using CVS instrument

作　　者：胡文强 易家香 周仲承 王克军 杨盟辉 黄革 

机构地区：[1]中南电子化学材料所,湖北武汉430070

出　　处：《印制电路信息》2013年第1期27-29,共3页Printed Circuit Information

摘　　要：循环伏安剥离分析是目前印制线路板业界广泛采用的一种分析技术,其结果可以作为离线或在线添加有机添加剂的依据,保障镀液的品质。本文对电镀铜中的有机添加剂和CVS技术的电化学原理进行了介绍,对运用CVS分析仪测试电镀添加剂浓度的方法和步骤进行了介绍,介绍了两则运用CVS分析仪分析调整电镀铜镀液的实例。As an analyzing instrument,Cyclic Voltammetric Stripping is being widely used in PCB factories.The results gave by CVS can be used as direction for the monitoring of acid copper plating solution and the guarantee of the copper coating.In this article,at first,the working principles of the additives in acid copper plating solution and the CVS instrument were introduced.Then,the method and operating steps of using CVS to determine the concentrations of the additives were suggested.At last,two examples of using CVS to monitor the cid copper plating solution were presented.

关 键 词：循环伏安剥离分析仪 有机添加剂 酸性镀铜液 抑制剂 光亮剂 

分 类 号：T-1[一般工业技术] TN41[电子电信—微电子学与固体电子学]