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作 者:高小青[1] 饶雪辉[1] 王吉德[1] 肖峰[1] 宿新泰[1]
机构地区:[1]新疆大学石油天然气精细化工教育部重点实验室,乌鲁木齐830046
出 处:《化学进展》2013年第1期105-114,共10页Progress in Chemistry
基 金:国家自然科学基金项目(No.21163020);教育部重点项目(No.211199);新疆维吾尔自治区自然科学基金项目(No.2011211A021)资助
摘 要:氧化钨(WOx)无机半导体材料因其独特的物理化学性质及在气敏、光催化、电致变色、光致变色和场发射等领域的广泛应用,得到人们的普遍关注。近年来,研究者采用水热法制备出多种不同尺寸和形貌的氧化钨半导体材料。本文结合本课题组在水热法制备WOx粉体方面的最新工作,综述了近十年水热法制备微米及纳米级氧化钨粉体的研究进展,探讨了原料、辅助试剂、表面活性剂、反应时间、反应温度等条件对水热法制备氧化钨粉体材料的影响。最后,对水热法制备氧化钨粉体的发展趋势进行了展望。Tungsten oxides inorganic semiconductor materials have received considerable attention in recent years because of their unique physico-chemical properties and widespread applications in various areas, such as eleetrochromic (EC) devices, gas sensors, photocatalytic systems, photoelectroehemical devices, and so on. Recently hydrothermal method has been exploited for the preparation of tungsten oxide micro/nanostructures with different sizes and shapes. Combining with our group's work on the preparation of tungsten oxide micro/ nanomaterials, the progress of preparation of tungsten oxide micro/nanomaterials by hydrothermal method is presented. The key influencing factors, such as the choice of reagents, the reaction time and temperature, are discussed in detail. The development trends of the tungsten oxide micro/nanomaterials fabricated by hydrothermal method are also proposed.
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