西瓜植株残体腐解过程中酚酸化合物的动态变化  

Phenolic Acids in Decomposing Residuces of Watermelon

作　　者：吕卫光[1,2] 杨广超[2] 刘玲[2] 张春兰[2] 沈其荣[2] 李双喜[1] 郑宪清[1] 

机构地区：[1]上海市农业科学院生态环境保护研究所,上海市设施园艺技术重点试验室,农业部上海农业环境与耕地保育科学观测实验站,上海201403 [2]南京农业大学资源与环境科学学院,江苏南京210095

出　　处：《华北农学报》2012年第B12期154-157,共4页Acta Agriculturae Boreali-Sinica

基　　金：国家科技部成果转化项目(2006GB23600454);上海市科委成果转化项目(103919N1300)

摘　　要：采用湿润好气培养法,研究连作西瓜植株残体根、茎、叶腐解过程产生的自毒物质-酚酸化合物的动态变化。结果表明,西瓜根、茎、叶残体腐解过程中均含有香豆酸、香草酸、阿魏酸等酚酸化合物。根和茎在腐解过程中产生的酚酸化合物主要是香豆酸和阿魏酸,叶片主要是香豆酸和苯丙烯酸。3种器官中酚酸化合物质总量表现为叶>茎>根。根、茎在腐解30 d时酚酸量达到高峰,叶在腐解20～30 d时酚酸量最高;到40～50 d时酚酸量很少,基本稳定。Variation of phenolic acids during decomposition of residuces of watermelon was studied by means of moist and aerobic cultivation.The results showed that watermelon residues of root,stem and leaf contained some kinds of phenolic acids such as p-coumaric,vanillic,ferulicacid.The contents of p-coumaric acid in root and stem were the highest,and followed by that of ferulic acid.The content of p-coumaric acid in leaf was the highest,followed by that of cinnamic acid.The total phenolic acids contents are in a decreasing order,leaf,stem and root.The total phenolic acids contained in the root and stem reached the maximum after 30 days of decomposition,while the leaf in 20-30 days.The total phenolic acids contents reached a stable and minimum state after 40-50 days.

关 键 词：西瓜 连作障碍 自毒物质 酚酸化合物 

分 类 号：S651.01[农业科学—果树学]