工艺条件对冲液电铸微结构粗糙度及形貌的影响  

Influence of Technological Conditions on the Roughness and Morphology of Metal Microstructure Prepared by Flushing Electrodeposition

作　　者：葛鲁波[1] 温瑞[1] 

机构地区：[1]浙江工商职业技术学院,浙江宁波315012

出　　处：《电镀与环保》2013年第1期7-9,共3页Electroplating & Pollution Control

摘　　要：采用冲液电铸工艺制备金属微结构,研究了阴极电流密度和冲液速率对微结构粗糙度及形貌的影响。结果表明:粗糙度随阴极电流密度的增加(0.5～1.3A/dm2)而增大,但随冲液速率的提高(0.2～1.3m/s)而减小;阴极电流密度和冲液速率均对微结构的形貌有明显影响,当阴极电流密度为0.5A/dm2且冲液速率为1.3m/s时,微结构的形貌质量最优。The metal microstructure was prepared by flushing electrodeposition, and the effects of cathode current density and flushing speed on its roughness and morphology were investigated. The results show that the roughness increases as the cathode current density goes up （0. 5-1. 3 A/dm2）, but decreases as the flushing speed increases （0. 2-1. 3 m/s）, and cathode current density and flushing speed both have an obvious effect on the surface morphology. When the cathode current density and flushing speed are 0. 5 A/dm2 and 1. 3 m/s respectively, the electrodeposited microstructure possesses optimal morphology quality.

关 键 词：工艺条件 冲液 粗糙度 形貌 

分 类 号：TQ153[化学工程—电化学工业]