椭偏法测量薄膜厚度与折射率实验的若干探讨  

Some Explorations on Measuring the Refractive Index & Thickness of Films Based on Ellipsometry

作　　者：何龙庆[1] 

机构地区：[1]南京晓庄学院物理与电子工程学院,江苏南京211171

出　　处：《南京晓庄学院学报》2012年第6期26-30,共5页Journal of Nanjing Xiaozhuang University

摘　　要：作者利用光学实验中的常规仪器完成了椭偏法测量薄膜的厚度与折射率,探讨了减小误差,提高测量精度的措施.文中还对文献[2]中某些易于产生困惑之处做了分析并给出了合理的解释.The refractive index and thickness of films are measured by common optical instruments according to the rule of ellipsometry, with some measures taken to improve the measure accuracy. It is pointed out that the transforn relationship between （P1, A1 ） and （P2, A2 ） are the same whether the direction-angle of the fast axis of the aquarter wave plate is α = ,π/4, or α = - π/4.

关 键 词：椭圆偏振术 薄膜厚度 折射率 1 4波片快轴 

分 类 号：O436[机械工程—光学工程]