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机构地区:[1]山东师范大学物理与电子科学学院,山东济南250014
出 处:《纳米科技》2012年第6期76-80,共5页
摘 要:采用真空蒸发法制备相同厚度的PbTe薄膜,再利用RF磁控溅射法在上面制备不同厚度的Ag反射膜,采用XRD、SEM、FTIR和四探针法分别对制备样品的物相组成、表面形貌、透射率和电阻率进行测试,结果显示,所制备的薄膜具有明显的〈100〉方向择优取向,呈多晶结构,随着反射膜厚度的增加,薄膜结晶性能先降低后增加;晶粒尺寸增加,表面粗糙程度先降低后增加;薄膜光学性能在一定膜厚范围内,随着反射膜厚度的增加透射率降低,超过一定膜厚时,透射率降为零;随着反射膜厚度的增加,电阻率呈先急剧降低后缓慢降低的趋势。The same thickness of the PbTe films were prepared by vacuum evaporation, then the different thickness of Ag reflection films over the PbTe films were made by RF magnetron sputtering.The phase composition, surface morphology, transmittance and resistivity of the samples were characterized by XRD, SEM, FTIR and four probes method. The resuhs showed that the films had obvious〈100〉 direction optimizing orientation and had polycrystalline structure, with the increasing of the thickness of Ag reflection film, the crystallization behavior of the film firstly increased and then decreased; the size of crystal grain increased and the roughness of surfaces firstly increased and then decreased. The optical performance of the film changed, the transmittance reduced with the increasing of the thickness of the Ag reflection film in a certain film thickness range, when the film exceeded a certain thickness range, the transmittance reduced to zero. The resistivity frst sharply reduced then reduced slowly with the increasing of the thickness of Ag reflection film.
分 类 号:TM23[一般工业技术—材料科学与工程] TB43[电气工程—电工理论与新技术]
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