大型红外辐射面源的设计  

Design of large size infrared radiant planar source

作　　者：钱婧[1,2] 孙胜利[1,2] 于胜云[1] 沙晟春[1] 盛敏健[1] 雍朝良[1] 

机构地区：[1]中国科学院上海技术物理研究所,上海200083 [2]中国科学院红外探测与成像技术重点试验室,上海200083

出　　处：《红外与激光工程》2013年第1期31-35,共5页Infrared and Laser Engineering

基　　金：中国科学院知识创新工程重要方向性项目(CX200502030)

摘　　要：红外辐射面源应用于特定红外特性目标的模拟,各种红外探测、制导系统的外场测试,红外目标源标红外辐射性能基本取决于面源温度场的控制。介绍了大型红外辐射面源系统的主要组成,采用外凸锥型制作辐射源表面以提高红外发射率。采用大功率加热管结合温控仪进行升温控制,通过分析及计算确定了加热系统的功率,并通过CFD仿真进行了冷却系统的风道设计及风扇选型。实验得出大尺寸辐射面温度的稳定性及均匀性均满足设计要求,可在30 min内将辐射面温度均匀控制在[80℃,300℃]范围内,误差小于±1.5℃,可以设定温度以模拟不同的红外特性。Infrared radiant planar source is used to simulate certain infrared characteristic target, widely used in different infrared detection, controlling and guiding equipment＇s outer field test. The performance of infrared radiant planar source basically depends on its temperature field control. The structure and main parts of radiant planar source were described. Taper shape was adopted at planar surface to increase the infrared emissivity. High power heater controlled by temperature controller was used for heating. The heating power was determined by thermal analysis and calculation. The air duct was designed and suitable cooling fans were selected through CFD simulation. The experiment results show that the temperature stability and uniformity of whole radiant plane fulfill the requirement. The radiant source can be adjusted at any temperature in a range of [80℃,300℃] within 30min. The temperature deviation is less than ±1.5℃. The radiant source can simulate different infrared behaviors by setting different work temperature.

关 键 词：红外辐射源 温控 黑体 热设计 

分 类 号：TN216[电子电信—物理电子学] TN219