响应面法优化四氯化硅制备超细白炭黑工艺  

Optimization of preparation technology of ultrafine silica from silicon tetrachloride by response surface methodology

作　　者：郑典模[1] 周桂明[1] 卢钱峰[1] 朱实贵 

机构地区：[1]南昌大学环境与化学工程学院,江西南昌330031 [2]赣锋锂业股份有限公司

出　　处：《无机盐工业》2013年第2期27-28,35,共3页Inorganic Chemicals Industry

摘　　要：以四氯化硅和水玻璃为原料,在单因素实验基础上,采用响应面优化工艺并建立数学模型,探讨水玻璃质量分数、添加剂质量分数和反应温度各因素之间相互作用对白炭黑DBP吸收值的影响。确定了最佳工艺条件:w(水玻璃)=8.6%、w(添加剂)=2.7%、水解温度为76℃。在此条件下,制得的白炭黑DBP吸收值为2.806 7,与预测值2.801 1仅有0.005 6的误差,证明该模型具有较好的拟合度,能够真实地反映各实验因素对DBP吸收值的影响。Based on smgle-iactor experiments, preparation tecnnology of ultratme silica wlm silicon tetracnlonoe ann sodium silicate as raw materials was optimized by response surface and mathematic model was established.Influences of the interaction of various factors, such as mass fraction of sodium silicate, mass fraction of additive, and reaction temperature on DBP absorption value of silica were investigated.The optimum conditions were confirmed as follows： the mass fraction of sodium silicate was 8.6%, the mass fraction of additive was 2.7%, and the reaction temperature was 76 ℃.The DBP absorption value of silica was 2.806 7 under the optimum conditions,with the error of 0.005 6 compared with the predict value of 2.801 1.h revealed that the model had better fitting degree, and could reflect the influence of various experimental factors on DBP absorption value.

关 键 词：四氯化硅 响应面 超细白炭黑 

分 类 号：TQ127.11[化学工程—无机化工]