TiN多弧离子镀涂层质量与X射线衍射图谱  

Relationship of X-ray Diffraction Pattern with TiN Coatings Quality

作　　者：宫秀敏[1] 叶卫平 孙伟[1] 许大庆[2] 朱小清[3] 

机构地区：[1]武汉汽车工业大学材料学院,湖北武汉430070 [2]华中理工大学 [3]东风汽车公司

出　　处：《金属热处理》2000年第7期32-35,共4页Heat Treatment of Metals

摘　　要：对TiN多弧离子镀涂层的质量和性能进行了试验与分析。试验结果表明 :涂层的质量和性能与X射线衍射图谱之间存在着对应关系。在X射线衍射图谱中具有强烈TiN( 1 1 1 )择优取向的涂层表面光亮、结合强度高、硬度高、耐磨性好。The TiN coatings quality and performance by multi arc process are studied.The results show that there is a close relationship between the coatings quality and performance and X ray diffraction (XRD) pattern of the coatings.If TiN phase has strongly preferential orientation in the crystal face (111) and the coatings surface color is bright,the coatings quality and performance are high in adhesive strengthen,hardness and wear resistance.

关 键 词：TiN离子镀 X射线衍射图 择优取向 涂层质量 

分 类 号：TG174.444[金属学及工艺—金属表面处理]