HP40合金表面原位制备复合氧化层  

In-situ preparation of compound oxidation scales on HP40 alloy

作　　者：颜磊[1] 刘京雷[1] 徐宏[1] 任衍伦[1] 

机构地区：[1]华东理工大学机械与动力工程学院化学工程联合国家重点实验室,上海200237

出　　处：《中国有色金属学报》2013年第1期175-181,共7页The Chinese Journal of Nonferrous Metals

基　　金：教育部博士点基金项目(20110074110009);上海市教委曙光跟踪计划项目(10GG66)

摘　　要：采用原位氧化法于H2和水蒸汽形成的低氧分压环境中,在HP40合金表面制备复合氧化膜。用XRD、EDS和SEM分别表征合金表面氧化膜的物相、成分、形貌,以及在氧化层截面上各组元的线和面分布状态。结果表明,随着制备温度的升高,合金表面MnCr2O4尖晶石逐渐增加,其形貌由针状逐渐变为颗粒状,颗粒尺寸小于1μm;氧化膜的总厚度为7μm,由外向内分别为MnCr2O4尖晶石、Cr2O3和SiO2 3层。Compound oxide scales were in-situ prepared on the surface of HP40 alloy in the H2/steam atmosphere with low oxygen partial pressure at 900-1 200℃. Then, the oxide scales on HP40 alloy were characterized by SEM, EDS and XRD. The results show that the quantity of MnCr204 spinel of the scale increases with the heat treating temperature increasing, while the morphologies of the scale change from acicular to granulate. The size of spinel granules on the surface is smaller than 1 μm. The total thickness of the formed oxide scales is about 7 μm, which can be characterized as three layers, i.e., the outer MnCr204 spinel layer, the middle Cr203 rich layer, and the most inner SiO2 layer, respectively.

关 键 词：HP40合金 原位氧化法 低氧分压 

分 类 号：TG132.3[一般工业技术—材料科学与工程]