活性屏等离子体源渗氮技术原理及应用  

Principle and application of active screen plasma source nitriding

作　　者：李广宇[1] 王中一[1] 陈琳[1] 曹雪梅[1] 王知源[1] 雷明凯[1] 

机构地区：[1]大连理工大学材料科学与工程学院表面工程实验室,辽宁大连116024

出　　处：《金属热处理》2013年第2期9-14,共6页Heat Treatment of Metals

基　　金：国家自然科学基金(50725519)

摘　　要：活性屏等离子体源渗氮技术是一种先进的渗氮技术,消除了常规直流等离子体渗氮技术的固有缺陷,且可处理聚合物材料及表面附着氧化皮的金属材料。本文介绍了活性屏等离子体源渗氮技术传质机理的研究进展,在改性低合金钢、不锈钢、工具钢、聚合物材料以及抗菌功能材料等方面的最新结果,评述了活性屏等离子体源渗氮技术存在的问题和发展趋势。The active screen plasma source nitriding is a novel nitriding technology, which can overcome the inherent shortcomings associated with conventional direct current plasma nitriding technology. The active screen plasma source nitriding technology can also be used to treat polymeric materials and oxidized steels. The paper describes the principle of nitrogen mass transfer for active screen plasma source nitriding, and the applications of active screen plasma source nitriding in modifying low alloy steels, stainless steels tool steels, polymer and antibacterial materials. The problem and future development direction of active screen plasma source nitriding are proposed.

关 键 词：等离子体源渗氮 金属 聚合物 传质机制 

分 类 号：TG156.82[金属学及工艺—热处理]