ZrW_2O_8薄膜的制备及热膨胀性质  

Preparation and thermal expansion properties of ZrW_2O_8 thin film

作　　者：李刚[1] 柳宁[1] 刘海宏[1] 李琳[1] 王莉娜[1] 

机构地区：[1]哈尔滨师范大学化学化工学院,黑龙江哈尔滨150025

出　　处：《金属热处理》2013年第2期39-42,共4页Heat Treatment of Metals

基　　金：黑龙江省高校科技创新团队建设计划项目(2011TD010);哈尔滨师范大学科技发展预研项目

摘　　要：采用溶胶-凝胶技术结合退火工艺在Pt(111)/Ti/SiO2/Si(100)基片上制备ZrW2O8薄膜,并研究了退火温度、退火时间对薄膜的影响。利用X射线衍射(XRD)及扫描电镜(SEM)对薄膜的物相及表面形貌进行表征;利用变温XRD研究薄膜的热膨胀性能。薄膜的变温XRD结果表明,在室温～700℃温度范围内,随着温度的升高,(211)和(310)晶面间距变小,其热膨胀系数为负值,而(332)晶面间距随温度升高变大,显示出正膨胀性质。这表明ZrW2O8薄膜材料的热膨胀性能是各向异性的。ZrW2O8 thin film was prepared on Pt（ 111 ）/Ti/SiO2/Si（100） substrate by sol-gel technique and thermal treating. Effects of annealing temperature and holding time were investigated systematically. X-ray diffraction （XRD） and scanning electron microscope （SEM） were used to characterize the phase and morphology of films. The thermal expansion properties of thin film were tested by variable- temperature X-ray diffraction. From room temperature to 700℃ , various temperature XRD data of ZrW20s thin films showed that because the interplanar distance of （211 ） and （310） became smaller, the thermal expansion coefficient was negative with increasing temperature. However, because the interplanar distance of （332） became larger with increasing temperature and the thermal expansion displayed positive. It indicates that ZrW2O8 thin film shows up an anisotropic property.

关 键 词：负热膨胀 钨酸锆 溶胶-凝胶 薄膜 

分 类 号：TQ174[化学工程—陶瓷工业]