溅射功率对PET基表面沉积纳米铜膜特性影响  

Influence of sputtering power on the properties of Cu thin films deposited on the surface of polyester plain fabric

作　　者：孟灵灵[1,2] 黄新民[1] 魏取福[2] 

机构地区：[1]盐城工学院纺织服装学院,盐城224051 [2]江南大学生态纺织教育部重点实验室,无锡214122

出　　处：《化工新型材料》2013年第2期112-114,共3页New Chemical Materials

基　　金：高等学校博士学科点专项科研基金(20090093110004)

摘　　要：室温条件下采用射频磁控溅射法在涤纶(PET)平纹机织物表面沉积纳米Cu薄膜,借助原子力显微镜(AFM)分析溅射功率的变化对铜膜表面形貌、粒径的影响;同时研究不同溅射功率条件下制备的沉积纳米铜织物透光性能、导电性能及界面结合性能。实验结果表明,随着溅射功率增加,纳米铜膜颗粒大小、表面粗糙度随之减小,铜膜的均匀性、致密性先提高后下降;经Cu镀层处理的涤纶平纹织物对紫外光和可见光透射率明显低于原样,溅射功率提高能使样品屏蔽紫外线和可见光效果变好,但功率提高到120W后,屏蔽效果增加不明显;铜膜方阻随溅射功率提高而减小,导电性能增强,而铜膜与基材的剥离强力先增加后减少。The copper thin films of nano-structured were prepared on the surface of polyester plain weave fabric by RF（radio frequency） magnetron sputtering at room temperature,The effect of sputtering power on the morphology and par-ticle diameters of the film was characterized by AFM （atomic force microscope）. The transmission properties, electrical properties and interracial properties of the fabrics with Cu films prepared under different sputtering powers were analyzed. Results showed that particle sizes and surface roughness of the film were decreased with the increase of sputtering power, the uniformity and compactness of the film were first improved and then decreased. The shielding effectiveness of samples hadno evident increase as sputtering power was rised to 120 w, sheet resistance of the filmswas minished and electrical property was enhanced,but peel bond strength of the film and the substrates were first increased and then decreased.

关 键 词：射频磁控溅射 纳米铜膜 原子力显微镜 透光性 导电性 界面性能 

分 类 号：TQ153.14[化学工程—电化学工业]