真空热压技术制备EOS实验用LiH薄膜  

Preparation of LiH Film Used in EOS Experiment by Vacuum Hot Pressing Technology

作　　者：谢军[1] 邢丕峰[1] 易泰民[1] 赵利平[1] 李朝阳[1] 杨蒙生[1] 郑凤成[1] 张林[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900

出　　处：《稀有金属材料与工程》2013年第2期424-428,共5页Rare Metal Materials and Engineering

基　　金：国家"863"计划项目资助

摘　　要：氢化锂(LiH)是重要的热核材料,其状态方程参数是惯性约束聚变研究的重要内容。本工作采用真空热压技术制备氢化锂薄膜,在真空度小于5.0×10-4Pa,温度450℃,升温速率10℃/min,采取分段加压、退火,获得了厚度小于100μm、厚度一致性约98%的氢化锂薄膜,表面粗糙度小于100nm,热压后密度增加,达到0.780g/cm3。X射线衍射分析结果表明:薄膜的主要成分为氢化锂,薄膜存在择优取向、内应力、晶粒细化等特征。Lithium hydride （LiH） is one important thermo nuclear materials and its equation of state （EOS） date is of importance in inertial confinement fusion. In this paper, LiH film was produced by vacuum hot pressing technology. Process parameters were given below： vacuum was less than 5.0×10^-4 Pa, the temperature was 450 °C, calefactive velocity 10 °C /min and the pressure from 4000 N/cm2 to 25000 N/cm^2. The results indicate that thickness of LiH film is less than 100 μm, surface root mean square roughness less than 100 nm and thickness uniformity more than 98%. And the main component of film is LiH from XRD. LiH film has prefer-oriented, crystal-fined characteristic and internal stress.

关 键 词：氢化锂 薄膜 热压 状态方程 

分 类 号：TL632[核科学技术—核技术及应用]