低收缩耐候性紫外光固化材料的研制  

Research on Low Shrinkage and Weathering Resistance UV-curable Material

作　　者：吕雪松[1] 翁睿[1] 

机构地区：[1]武汉理工大学材料科学与工程学院,武汉430070

出　　处：《武汉理工大学学报》2013年第2期12-15,共4页Journal of Wuhan University of Technology

基　　金：国家"863"项目(2003AA305071)

摘　　要：采用正交试验的方法,研制了一种新型低收缩耐候性紫外光固化材料。该体系包括KH-570改性的自制纳米二氧化硅(75nm)、自制双酚A环氧丙烯酸、光引发剂(831、1 173)、活性稀释剂TMPTA及螺环膨胀单体(3,9-二乙基-3,9-二羟甲基-1,5,7,11-四氧杂螺环-5,5-十一烷)。通过控制改变二氧化硅、活性单体、光引发剂、螺环单体与丙烯酸树脂的不同配比进行试验。结果表明:当二氧化硅用量为10%,活性稀释剂TMPTA用量15%,膨胀单体用量15%,复合光引发剂用量3%时,体系综合性能最佳,耐紫外老化性能得到明显改善。该体系性能优良,有广阔的应用前景,当改变稀释剂种类时,还可以应用于补牙材料。We aim at developing a new type of low shrinkage and weathering resistance UV-curable material. The method used in our study is known as the orthogonal test method. Materials we used in this study are listed below：nano- meter silica （75 nm） modified by KH-570, double-phenol A epoxy acrylic（self-made）, photoinitiator（831,1 173）, reactive diluent TMPTA, spirocyclic expending monomer 3,9-dihydroxymethyl-3,9-diethyl-1,5,7,11 tetraoxaspiro [5,5] unde- cane. Detailed information has been acquired by us changing the different ratio of nanometer silica, acrylic resin, active monomer, photoinitiator and spirocyclic monomer. As a result of our experiment,we concluded that when the spirocyclic monome dosage is used 15% by the weight of acrylic resin, silica is 10% ,TMPTA is 15%, photoinitiator is 3%, we can get the best comprehensive performance. The ultraviolet ray resistance also improved obviously. The composite resin has excellent mechanical performance and it can be used widely. If changed the diluent, it can also be used as dental materials.

关 键 词：正交试验 纳米二氧化硅 膨胀单体 

分 类 号：V258[一般工业技术—材料科学与工程]