电沉积Ni-W纳米梯度镀层  

ELECTRODEPOSITION OF NI-W GRADIENT DEPOSIT WITH NANOSTRUCTURE

作　　者：姚素薇[1] 王宏智[1] 桂枫[1] 

机构地区：[1]天津大学化工学院,天津300072

出　　处：《天津大学学报（自然科学与工程技术版）》2000年第4期526-529,共4页Journal of Tianjin University：Science and Technology

基　　金：国家自然科学基金资助项目 !( 593710 6 2 )

摘　　要：首次采用电沉积法制备 Ni- W纳米结构梯度镀层 .SEM能谱测试及 X-射线衍射测试表明 ,沿镀层生长方向 ,钨含量逐渐增加 ,晶粒尺寸由 1 0 .2 7nm递减到 1 .56nm,晶格畸变度逐渐增大 ,镀层由纳米晶结构逐步过度到非晶态结构 .结构呈梯度分布 。The Ni W gradient deposit with a nano structure was firstly prepared by the electrodeposition method.EDAX and XRD tests indicate that the crystal grain dimension of the deposit decreased from 10.27 nm to 1.56 nm and the crystal grating aberrance increased with the increase of W content in the direction of growth of the deposit.As a result,the structure of the deposit changed from crystalline to amorphous step by step with the accretion of crystal grating aberrance,and presented gradient distribution.All this showed this deposit was a gradient coating with a nano structure.

关 键 词：电沉积 NI-W合金 纳米梯度 纳米材料 

分 类 号：TB383[一般工业技术—材料科学与工程]