基于集成技术的金刚石对顶砧原位电学量测量  

In Situ Electrical Measurement in Diamond Anvil Cell Equipped with Microcircuit by Integration Technology

作　　者：高春晓[1] 

机构地区：[1]吉林大学超硬材料国家重点实验室,吉林长春130012

出　　处：《高压物理学报》2013年第1期1-18,共18页Chinese Journal of High Pressure Physics

基　　金：国家重点基础研究发展计划(973计划)(2011CB808204);国家自然科学基金(91014004;11074094)

摘　　要：金刚石对顶砧是应用最多的高压装置,能够产生超过400GPa的超高压力,借助激光加温,还可以加载6 000K的高温。近20年来,基于金刚石对顶砧的微小测量电路集成技术的突破,带动了高压原位电学量测量技术的发展,使常压下能够测量的电学量大部分都能在金刚石对顶砧中的高压环境下实现。全面回顾了基于集成技术的金刚石对顶砧高压原位电学量测量技术的发展历程,介绍了最新的技术进展。Diamond anvil cell （DAC） can produce more than 400 GPa ultra-high pressure and have been used widely in high pressure science. By means of laser heating,about 6 000 K high temperature can be realized in DAC. In the past 20 years, many technical progresses in microcircuit fabrication on DAC have been made by using film integration technology, and a series of achievement in in-situ electrical measurement with DAC have been obtained. Today, most electrical parameters measured at normal condition can be obtained in DAC. In this article,the history and progress of the integration technology related to fabricating microcircuit on DAC for electrical measurement under high pressure have been comprehensively reviewed,and the latest technological advances have also been introduced.

关 键 词：金刚石对顶砧 高压 原位电学测量 

分 类 号：O521.3[理学—高压高温物理]