双极型集成电路的版图设计工艺  

The double pole integrated circuit shallowly the domain design craft

作　　者：周家萍[1] 

机构地区：[1]兴义民族师范学院,贵州兴义562400

出　　处：《兴义民族师范学院学报》2012年第6期109-112,共4页Journal of Minzu Normal University of Xingyi

摘　　要：随着信息科技的发展,双极型集成电路得到广泛应用,双极型集成电路的版图设计工艺成了改进集成电路性能的一个指标。可从版图设计原则、整体版图设计、元件版图设计、布局布线几个方面对双极型集成电路版图设计工艺进行研究。With the development of information technology, bipolar integrated circuits widely, bipolar integrated circuit layout design process has also become an indicator of improving the performance of integrated circuits, from the principles of layout design, the whole landscape design, landscape design, component placement and routing aspects of bipolar integrated circuit layout design process are deseussed.

关 键 词：双极型集成电路 制造工艺 版图设计 

分 类 号：TN401[电子电信—微电子学与固体电子学]