低压等离子喷涂厚钨涂层的组织与性能  

Microstructure and Performance of Tungsten Coatings Prepared by Low Pressure Plasma Spraying

作　　者：杨震晓[1,2] 刘敏[2] 邓春明[2] 陈明娟[1,2] 邓畅光[2] 车晓舟[1] 

机构地区：[1]华南理工大学材料科学与工程学院,广东广州510640 [2]广州有色金属研究院,广东广州510650

出　　处：《材料保护》2013年第2期13-15,19,共4页Materials Protection

基　　金：国际热核聚变实验堆(ITER)计划项目(2010GB109002)资助

摘　　要：为获得高致密度、高热导率及低氧含量的钨喷涂层,采用低压等离子喷涂(LPPS)技术,以4种不同工艺参数在铬锆铜基体上制备了0.9～1.2 mm钨喷涂层。用扫描电镜、氧氮分析仪及闪光导热仪研究了4种钨喷涂层的显微结构、氧含量及热导率,揭示了优化工艺制备的钨喷涂层的孔径分布,分析了喷涂功率和真空室压力对涂层的影响。结果表明,4种钨喷涂层均呈层状结构,优化工艺制备的钨喷涂层的致密度为98.4%,氧含量为0.2%(质量分数),热导率为110.76 W/(m.K),孔隙的主要孔径分布范围为0.2～4.0μm,以1.0μm左右的孔隙为主。W coatings with thickness of 0.9～1.2 mm were fabricated on CuCrZr substrate by low pressure plasma spraying(LPPS) while four sets of spraying parameters were adopted.The microstructure,oxygen content and thermal conductivity of assprayed W coatings were analyzed with a scanning electron microscope,an oxygen and nitrogen analyzer,and a flashlight heat conducting meter.The pore size distribution of the W coatings prepared under the optimized spraying parameters was determined,and the effects of spraying power and vacuum chamber pressure on the microstructure and performance of assprayed W coatings were investigated.It was found that the four kinds of assprayed W coatings all had laminar structure,and the W coating obtained under the optimized spraying parameters had a compactness of 98.4%,an oxygen content of 0.2%(mass fraction),a thermal conductivity of 110.76 W/(m·K),and a pore size distribution of 0.2~4.0 μm(the dominant pore size was about 1.0 μm).

关 键 词：低压等离子喷涂 钨喷涂层 显微结构 孔径分布 

分 类 号：TG174.442[金属学及工艺—金属表面处理]