电感耦合等离子体原子发射光谱法测定钢铁中微量硅  

Determination of Microamount of Silicon in Steel by Inductively Coupled Plasma-Atomic Emission Spectrometry

作　　者：龚静[1] 张文莉[1] 邱德仁[1] 杨芃原[1] 胡克 王琥 游俊富 

机构地区：[1]复旦大学化学系,上海200433 [2]上海市计量测试技术研究所,上海200233

出　　处：《分析化学》2000年第8期971-973,共3页Chinese Journal of Analytical Chemistry

摘　　要：在综述文献和谱线表数据的基础上，实验研究了ＩＣＰ－ＡＥＳ法测定钢铁中硅的分析线。基体匹配得标样经校正后，Ｓｉ２１２．４１２ ｎｍ和Ｓｉ２５１．６１２ ｎｍ分析线测定钢铁中硅的检出限达０．０００６％，比现行国家标准方法改善约两个数量级。Based on reviewing references and wavelength tables, experimental investigation of Si lines for the determination of Si in steel is reported. Calibration was made under conditions of matrix match and blank correction. Limit of detection is 6 x 10^(-4) % for Si 212.412 um and Si 251. 612 um and is two orders of magnitude betten than the current national standard methods.

关 键 词：硅 钢铁 微量分析 ICP-AES 

分 类 号：O657.3[理学—分析化学]