锆-4合金高温高压水蒸气氧化行为  

Oxidation behavior of zircaloy-4 in high-temperature and high-pressure water vapor

作　　者：王志武[1] 宋涛[1] 

机构地区：[1]武汉大学动力与机械学院,湖北武汉730072

出　　处：《中南大学学报（自然科学版）》2013年第2期515-519,共5页Journal of Central South University:Science and Technology

基　　金：国家自然科学基金资助项目(51071113)

摘　　要：利用不连续称重法测定锆-4合金于330,400和500℃高温高压水蒸气氧化动力学曲线,并对氧化膜成分和物相进行分析。研究结果表明:实验温度下氧化动力学曲线符合yn=Kt+C的抛物线规律;氧化膜在沟壑位置形核逐渐覆盖表面,第2层氧化膜以片状开始出现;氧化物主要是t-ZrO2和m-ZrO22种,低温时由于氧原子供应不足导致金属原子富余氧原子缺失的氧化物出现。Oxidation behavior of the zircaloy-4 at 330, 400 and 500 ℃ and high-pressure water vapor was investigated by discontinuous weighing method. The composition and phases of oxidation films were also analyzed. The results indicate that oxidation dynamic curve obeys parabolic law at all testing temperatures. The oxidation film is nucleated at ravine position, and then covers the surface gradually; the second oxidation film appears as slice-sharp, t-ZrO2 and m-ZrO2 are two main phases in the oxidation films. Oxides rich in metal atoms and lack of oxygen atoms appear at lower temperature due to short supply of oxygen.

关 键 词：锆-4合金 高温高压水蒸气氧化 动力学曲线 t-ZrO2 m-ZrO2 

分 类 号：TG174.1[金属学及工艺—金属表面处理]