Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography  

作　　者：张万经 马艳 李同保 张萍萍 邓晓 陈晟 肖盛炜 

机构地区：[1]Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Department of Physics,Tongji University

出　　处：《Chinese Physics B》2013年第2期228-231,共4页中国物理B（英文版）

基　　金：Project supported by the Shanghai Nanoscience Foundation,China (Grant Nos. 0852nm07000 and 0952nm07000);the National Natural Science Foundation of China (Grant Nos. 10804084 and 91123022);the National Key Technology R & D Program,China (Grant No. 2006BAF06B08);the Specialized Research Fund for the Doctoral Program of Ministry of High Education of China (Grant No. 200802471008)

摘　　要：Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically（in x axis）,and it is 0.55 horizontally（in y axis）.The theoretical model is also simulated,and success of our structured mirror array is achieved.Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically（in x axis）,and it is 0.55 horizontally（in y axis）.The theoretical model is also simulated,and success of our structured mirror array is achieved.

关 键 词：atom lithography structured mirror array laser Doppler cooling two-dimensional collimation 

分 类 号：TN305.7[电子电信—物理电子学] TU746.5[建筑科学—建筑技术科学]