低浓度氯化物三价铬电沉积工艺及其特性的研究  

A Study of Low Concentration Chloride Trivalent Chromium Electrodeposition Process and Its Features

作　　者：侯峰岩[1] 王斌腾[2] 屠振密[2] 

机构地区：[1]上海宝钢设备检修有限公司表面技术研究所,上海201900 [2]哈尔滨工业大学(威海)应用化学系,山东威海264209

出　　处：《电镀与环保》2013年第2期28-31,共4页Electroplating & Pollution Control

摘　　要：首先,在过去工作的基础上,通过单因素实验和正交实验,确定了低浓度氯化物三价铬电沉积工艺的镀液组成及工艺条件。其次,研究了镀液成分和工艺条件对镀液及镀层性能的影响。最后,对工艺的维护与调整进行了初步探索。Based on the work in the past, the bath composition and technological conditions of low concentration chloride trivalent chromium electrodeposition process were determined. The effects of bath composition and process conditions on the properties of the bath and coating were investigated. Finally, the maintenance and adjustment of the process were explored preliminarily.

关 键 词：低浓度 氯化物 三价铬 电沉积 工艺 特性 

分 类 号：TQ153[化学工程—电化学工业]