Friction and Wear Performances of Hot Filament Chemical Vapor Deposition Multilayer Diamond Films Coated on Silicon Carbide Under Water Lubrication  

作　　者：陈乃超 孙方宏 

机构地区：[1]School of Mechanical Engineering,Shanghai Jiaotong University

出　　处：《Journal of Shanghai Jiaotong university(Science)》2013年第2期237-242,共6页上海交通大学学报（英文版）

基　　金：the National Natural Science Foundation of China (No. 50975177)

摘　　要：Tribological properties of chemical vapor deposition (CVD) diamond films greatly affect its application in the mechanical field. In this paper, a novel multilayer structure is proposed, with which multilayer diamond films are deposited on silicon carbide by hot filament CVD (HFCVD) method. The different micrometric diamond grains are produced by adjusting deposition parameters. The as-deposited multilayer diamond films are characterized by scanning electron microscope (SEM) and white-light interferometry. The friction tests performed on a reciprocating ball-on-plate tribometer suggest that silicon carbide presents the friction coefficient of 0.400 for dry sliding against silicon nitride (Si3N4) ceramic counterface. With the water lubrication, the corresponding friction coefficients of silicon carbide and as-deposited multilayer diamond films further reduce to 0.193 and 0.051, respectively. The worn surfaces indicate that multilayer diamond films exhibit considerably high wear resistance.Tribological properties of chemical vapor deposition （CVD） diamond films greatly affect its application in the mechanical field. In this paper, a novel multilayer structure is proposed, with which multilayer diamond films are deposited on silicon carbide by hot filament CVD （HFCVD） method. The different micrometric diamond grains are produced by adjusting deposition parameters. The as-deposited multilayer diamond films are characterized by scanning electron microscope （SEM） and white-light interferometry. The friction tests performed on a reciprocating ball-on-plate tribometer suggest that silicon carbide presents the friction coefficient of 0.400 for dry sliding against silicon nitride （Si3N4） ceramic counterface, With the water lubrication, the corresponding friction coefficients of silicon carbide and as-deposited multilayer diamond films further reduce to 0.193 and 0.051, respectively. The worn surfaces indicate that multilayer diamond films exhibit considerably high wear resistance.

关 键 词：multilayer diamond films chemical vapor deposition (CVD) hot filament CVD (HFCVD) 

分 类 号：TH117.1[机械工程—机械设计及理论]