霍尔离子源辅助制备长波红外碳化锗增透膜  

Fabrication of The Long-wave Infrared Germanium Carbide Antireflection Coatings by End-Hall Ion Source

作　　者：王彤彤[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所光学系统先进制造技术重点实验室,吉林长春130033

出　　处：《发光学报》2013年第3期319-323,共5页Chinese Journal of Luminescence

基　　金：国家自然科学基金(60478035)资助项目

摘　　要：为了提高锗基底的透过率和环境适应性,镀制了增透保护膜。应用电子枪蒸发加霍尔离子源辅助的方法沉积了碳化锗(Ge1-xCx)薄膜。通过固定霍尔离子源参数,控制沉积速率的工艺得到了不同光学常数的碳化锗薄膜。X射线衍射(XRD)测试表明,所制备的碳化锗薄膜在不同的沉积速率下均为无定形结构。采用傅立叶变换红外(FTIR)光谱仪测量了试片的透过率,使用包络法获得了相应工艺条件下的光学常数。在锗基底上双面镀制碳化锗增透膜后,长波红外7.5～11.5μm波段的平均透过率Tave>85%。经过环境实验之后的碳化锗膜层完好,证明碳化锗增透膜具有良好的环境适应性。The antireflective and protective coatings were deposited on the germanium substrates to improve the transmittance and the environmental adaptability.The germanium carbide（Ge1-xCx） coatings were successfully fabricated.The pure germanium was evaporated by the e-gun,and the methane was directly ionized by End-Hall ion source.The different optical constants of the germanium carbide coatings were obtained by controlling the deposition rate and fixing End-Hall ion source parameters.The germanium carbide coatings with different deposition rates were all amorphous tested by X-ray diffraction.The optical constants were calculated by the envelope method from the transmittance data measured by Fourier transform infrared（FTIR） spectrometer.After double-side depositing the germanium carbide coatings on the germanium substrate,an average transmittance Tave85% was achieved in the long-wave infrared region of 7.5-11.5 μm.After the environment tests,the germanium carbide coating was fine,this indicates the germanium carbide coating has great environmental adaptability.

关 键 词：碳化锗 长波红外增透膜 离子辅助 霍尔离子源 

分 类 号：O484[理学—固体物理] TN304[理学—物理]