磁控溅射法制备TiN/TiO_2周期薄膜  

TiN/TiO_2 Periodic Films Prepared by Magnetron Sputtering

作　　者：刘莹[1] 胡云龙[1] 

机构地区：[1]南昌大学机电工程学院,南昌330031

出　　处：《中国表面工程》2013年第2期56-60,共5页China Surface Engineering

基　　金：国家自然科学基金(50730007)

摘　　要：采用直流反应磁控溅射法在Si(111)衬底上制备了不同周期数的TiN/TiO2周期薄膜。采用X射线衍射分析仪分析了薄膜的物相结构、原子力显微镜表征了薄膜的表面微观形貌,采用光催化降解甲基橙溶液来评价薄膜光催化性能。结果表明:所制备的TiN/TiO2周期薄膜结晶良好,薄膜由TiO2和TiN两种物相组成,TiO2均属于锐钛矿型。薄膜表面均匀致密,随着周期数的增加,薄膜表面粗糙度增加,1周期薄膜表面粗糙度(Ra)为1.652nm,5周期则为4.339nm,1周期薄膜均方根粗糙度(Rms)为2.138nm,5周期达5.738nm。薄膜具有显著的光催化性能,随着周期数的增加,TiN/TiO2薄膜的光催化性能逐渐增强,5周期薄膜对甲基橙溶液的降解率达到74%。结晶良好、表面均匀致密的具有光催化性能的TiN/TiO2周期薄膜的制备,为高质量TiN/TiO2周期薄膜的制备提供了参考。TiN/TiO2 periodic films with different period number were prepared by DC magnetron sputtering on p-type Si （111） substrate. The phase structure of periodic films was investigated by X-ray diffraction, the surface micro-topography was characterized by atomic force microscope, and the photoeatalysis of films was e- valuated by photocatalysis degradation of methyl orange solution. The results show that the prepared TiN/ TiOz periodic films are crystallized well, which is composed by TiO2 and TiN phase, and TiO2 are all anatase phase. The films surface is uniform and dense,with the increase of the period number, the film surface rough- ness increases,the Ra roughness of one period film is 1. 652 nm,and 4. 339 nm for five periods, while the Rms roughness of one period film is 2. 138 nm,and 5. 738 nm for five periods. With the increase of period number, the degradation rate of methyl orange solution increases, and the photocatalysis properties of TiN/TiO2 film gradually increase. The preparation of TiN/TiO2 periodic films with surface uniform surface and photocatalysis properties provides a basis for parameters for high-quality TiN/TiO2 periodic films.

关 键 词：TIN TIO2 磁控溅射 周期薄膜 光催化 

分 类 号：TG174.444[金属学及工艺—金属表面处理]