Mo衬底厚度对Ni-Mn-Ga形状记忆合金薄膜形貌及磁性能的影响  

Effects of Mo substrate thickness on the morphology and magnetic properties of Ni-Mn-Ga shape memory thin alloy films

作　　者：熊杰[1] 张敏刚[1] 柴跃生[1] 陈峰华[1] 张海杰[1] 

机构地区：[1]太原科技大学材料科学与工程学院,山西太原030024

出　　处：《磁性材料及器件》2013年第2期17-20,共4页Journal of Magnetic Materials and Devices

基　　金：山西省自然科学基金资助项目(2010011032-1);山西省研究生创新基金资助项目(20093096);太原市大学生创新创业专题资助项目(100115154);太原科技大学博士科研启动基金资助项目(20122036)

摘　　要：采用射频磁控溅射法制备不同厚度Mo衬底的Ni-Mn-Ga薄膜，采用扫描电子显微镜（FE-SEM）、原子力显微镜（AFM）、磁力显微镜（MFM）、振动样品磁强计（VSM）以及X射线衍射仪（XRD）对其形貌及磁性能进行观测和分析。实验发现，制备的Mo衬底Ni-Mn-Ga薄膜经退火后为T型马氏体结构，且当Mo衬底厚度在0-200nm范围内变化时，其饱和磁化强度及居里温度呈现先减小后增大的趋势。当Mo衬底厚度约为100nnl时饱和磁化强度和居里温度具有最低值。薄膜表面颗粒直径随着Mo厚度的增大而减小，但在Mo厚为100nm时出现增大。Ni-Mn-Ga shape memory thin films were prepared by radio-frequency magnetron sputtering on Mo substrates with different thicknesses. The effects of substrate thickness on the morphology and magnetic properties of Ni-Mn-Ga thin films were studied by AFM, MFM and VSM. The results indicates that Ni-Mn-Ga films with Mo substrate are T-type martensite; the saturation magnetization and the Curie temperature of the film decrease first and then increase with increasing Mo substrate thickness in the range of 0-200 nm, with minimum saturation magnetization and Curie temperature for sample with 100-urn-thickness Mo substrate. The surface particle size of Ni-Mn- Ga film decreases with increasing Mo thickness, but abnormally increases for 100- urn-thick sample.

关 键 词：Ni-Mn-Ga薄膜 Mo衬底 表面形貌 磁性能 

分 类 号：O484.43[理学—固体物理]