检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:梁森[1] 张笑[2] 罗民[1] 白宇[2] 杨建锋[2]
机构地区:[1]宁夏大学宁夏光伏材料重点实验室,宁夏银川750021 [2]西安交通大学金属材料强度国家重点实验室,陕西西安710049
出 处:《电子元件与材料》2013年第5期26-29,共4页Electronic Components And Materials
基 金:宁夏2012科技支撑计划资助项目(No.BQD2012003);宁夏大学人才科研启动项目资助
摘 要:首次采用超音速等离子喷涂(SAPS)方法在氧化铝基板上沉积了Ni0.6Mg0.3Mn1.3Al0.8O4厚膜,利用扫描电子显微镜、X射线衍射和电阻–温度特性测试仪研究了热处理温度对沉积厚膜性能的影响规律。结果表明:随热处理温度的升高,沉积厚膜的平均晶粒尺寸增大,尖晶石相增多;当热处理温度低于500℃时,所制厚膜的电阻–温度曲线在室温到80℃的温度范围内呈现V型特征,而在800℃和1 200℃处理后,厚膜的电阻在室温至200℃的温度区间内呈现良好的负温度特性。The Ni0.6Mg0.3Mn13Al0.8O4 thick films were firstly deposited on alumina substrate by supersonic atmospheric plasma spray (SAPS) method, the effects of heat treatment temperature on the properties of deposited thick films were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD) and resistance-temperature characteristic tester. The results show that the mean grain size as well as the content of spinel phase increases with the increasing of heat treatment temperature. Specifically, when the heat treatment temperature is lower than 500 ℃, R-t curves for the prepared thick-films show V-shaped characteristic at temperature range from room temperature to 80 ℃. Moreover, after the films were heat treated at 800 ℃ and 1 200 ℃, a behavior of negative temperature coefficient (NTC) of resistance can be obtained at the temperature range from room temperature to 200 ℃.
关 键 词:NTC热敏电阻 厚膜 SAPS 热处理温度 纳米晶 电阻-温度特性
分 类 号:TN372[电子电信—物理电子学]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.49