离轴涡旋光束干涉光场的理论研究  

Theoretical research of interference light field of off-axis vortex beam

作　　者：朱艳英[1] 陈志婷[1] 刘承师[1] 孟祥君[1] 魏勇[2] 郭西华[1] 张磊[1] 赵宝林[1] 

机构地区：[1]燕山大学理学院,河北秦皇岛066004 [2]燕山大学里仁学院,河北秦皇岛066004

出　　处：《光电子．激光》2013年第5期1012-1017,共6页Journal of Optoelectronics·Laser

基　　金：国家自然科学基金(50875232);秦皇岛市科学技术研究与发展计划(201101A071)资助项目

摘　　要：对普通拉盖尔-高斯涡旋光束和离轴拉盖尔-高斯涡旋光束干涉光场进行了理论模拟。对比分析表明,离轴涡旋干涉图样中光强分布不对称,拓扑荷取相同或者不同数值光强分布均向一个方向集中。拓扑荷取相同数值时,改变离轴参数d使得干涉光强图样不对称现象更加明显;拓扑荷取不同数值时,与普通涡旋光束干涉一样只影响光斑圆周展宽;且拓扑荷的正负决定光场集中分布的方向。当拓扑荷和离轴参数一定时,随着传输距离的增加观察面上的光斑展宽也在相应增加。其结果将对长距离探测涡旋光束干涉的对准问题以及利用涡旋光束捕获操纵微粒子起到指导性作用。Interference light fields of general Laguerre-Gaussian vortex beam and off-axis vortex Laguerre-Gaussian beam are simulated theoretically in this paper. By comparing and analyzing the simulation parameters,it is shown that the light intensity distribution of interference pattern of off-axis vortex beam is asymmetric, and the light distributions with the same or different topological charges are focused to one direction. With the same topological charge ,the asymmetric phenomenon of light intensity distribution pattern is more obvious, as the off-axis parameter d is changing. When the topological charges are different, to the interference of general vortex beam, only the circumference spreading of the light spot is affected,and when off-axis vortex beams with different topological charges interfere, it is identical to general vortex beam interference, and the positive or negative topological charge determines the direction of the light field concentration distribution. When the topological charge and off-axis parameter are fixed values, the width of light spot on the observation surface will increase accordingly with increasing the transmission distance. The simulation results show that this method is beneficial to the long distance observation of vortex beam interference alignment,and the analysis results are significant for trapping and manipulating micro-particles by using vortex beams.

关 键 词：拉盖尔-高斯光束 离轴涡旋光束 干涉光场 拓扑荷 螺旋相位板 

分 类 号：O436.3[机械工程—光学工程]