近场热辐射实验测量方法的进展  

Development of the Experimental Measurement for Near-field Thermal Radiation

作　　者：冯冲[1] 唐祯安[1] 余隽[1] 

机构地区：[1]大连理工大学电子科学与技术学院,大连116023

出　　处：《材料导报》2013年第9期55-60,共6页Materials Reports

基　　金：国家自然科学基金(60806038;31004)

摘　　要：总结了实验测量近场辐射传热的相关研究,指出对这种传热方式的实验测量中,利用当前的扫描探针技术控制两薄膜间距为微米级或纳米级并且保持相互平行是极其困难的,提出了结合CMOS(互补金属氧化物半导体)和MEMS(微机电系统)微加工工艺构造具有固定间隙平行薄膜结构的新思路。Based on studying almost all papers about experimental measurement of the near-field thermal radia- tive heat transfer, the difficulties on experimentally measuring near-field radiative heat transfer between thin-films are figured out by using the scanning probe technology, and a novel idea is given that fabricates parallel thin-films with fixed submicron gap by CMOS and MEMS technology.

关 键 词：近场 热辐射 实验测量 

分 类 号：O4-1[理学—物理]