自聚焦透镜分光膜的研制  

On the manufacturing of grin lens light-splitting film

作　　者：高晓丹[1] 

机构地区：[1]武汉东湖学院电子信息工程学院,湖北武汉430212

出　　处：《光学仪器》2013年第2期92-94,共3页Optical Instruments

摘　　要：为了不断改善和开发自聚焦透镜的性能,实现光学仪器中自聚焦透镜分光的要求,以Ta2O5和SiO2为介质材料,运用TFCalc膜系设计软件,采用解析法设计了一个初始膜系,再结合变尺度优化法对初始膜系进行优化设计,设计出具有较好光谱性能的1 470～1 610nm波段95∶5自聚焦透镜分光膜。分析了设计膜系在自聚焦透镜端面沿径向折射率呈梯度减少时的拟合反射率曲线。通过大量实验选择合适的镀制工艺,并采用德国莱宝APS1104型镀膜机对所设计的膜系进行实际镀制,获得了性能优良的自聚焦透镜分光膜。In order to improve the performance of grin lens and meet the requirement of grin lens light-splitting in optical instrument, With Ta2O5 and S1O2 selected as dielectric materials, an initial formula is given by the resolution method, then variable metric optimization method is used to optimize the initial formula by using TFCalc formula design software, the formula of grin lens light-splitting film with 95 to 5 from wavelength 1 470 nm to 1 610 nm and good spectral properties is obtained. The reflectance fitting curve of the designed formula is analysed when refractive index reduces as graded profile along grin lens radius. Appropriate deposition technology is chosen by a large number of experiments, and then the designed formula is deposited by the type APS1104 deposition machine made in Germany, in the end, grin lens light-splitting film with good performance is acquired.

关 键 词：分光膜 膜系 优化设计 镀制工艺 

分 类 号：O484.4[理学—固体物理]