根据磷铜阳极维护酸性光亮镀铜液中的氯离子  

Maintenance of chloride ion in acid bright copper plating bath based on phosphorus copper anode

作　　者：蒋金鸿[1] 

机构地区：[1]中国电子科技集团公司第五十一研究所,上海201802

出　　处：《电镀与涂饰》2013年第5期13-14,共2页Electroplating & Finishing

摘　　要：通过观察磷铜阳极表面的成膜情况来判断酸性光亮镀铜液中的氯离子含量。当镀液中的氯离子含量接近通常要求的上限或下限时,阳极表面的膜有明显变化,电镀产品则无明显变化。即阳极通常比阴极先反映出问题。本方法可及时指出因镀液中氯离子含量偏高或偏低引起的产品问题。The content of chloride ions in acid bright copper plating bath was estimated by observing the film-forming situation on phosphorus copper anode. When the content of chloride ions in plating bath is close to the usually required upper or lower limit, the film on anode surface changes obviously, while the plated products have no apparent change. That is, the anode can exhibit some changes earlier than the cathode. The given method can timely indicate the product problem caused by higher or lower chloride ion content in plating bath.

关 键 词：光亮酸性镀铜 磷铜阳极 氯离子 维护 

分 类 号：TQ153.14[化学工程—电化学工业]