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机构地区:[1]太原工业学院材料工程系,山西太原030008 [2]长治清华机械厂,山西长治046012
出 处:《电镀与涂饰》2013年第5期25-27,共3页Electroplating & Finishing
摘 要:以Nb49Ni25Ti26氢渗透合金或载玻片为基体,在不同温度下进行化学镀钯。化学镀钯液组成与工艺条件为:PdCl22g/LNaH2PO2·H2O10g/L,38%盐酸4mL/L,NH4Cl27g/L,28%氨水160mL/L,pH9.8±0.2,施镀时间2h。研究了镀液温度对镀速和Pd镀层表面形貌、耐蚀性及氢渗透性能的影响。结果表明,化学镀钯的最佳温度为60°C,此时镀速达到最大[为4.05mg/(cm2·h)],制备的Pd镀层均匀、致密,耐腐蚀性好,具有较强的氢渗透作用。Electroless palladium plating was carded out at different temperatures, using Nb49Ni25Ti26 hydrogen- permeable alloy or glass slide as the substrate. The composition of electroless palladium plating bath and process conditions are as follows: PdC12 2 g/L, NaH2PO2.H20 10 g/L, 38% hydrochloric acid 4 mL/L, NH4C1 27 g/L, 28% ammonia water 160 mL/L, pH 9.8 ± 0.2, and plating time 2 h. The effect of temperature on the deposition rate, surface morphology, corrosion resistance, and hydrogen permeability of electroless Pd coating was studied. The results show that the optimal temperature for electroless palladium plating is 60℃. The Pd deposition rate at 60 ℃ reaches the maximum of 4.05 mg/(cm^2.h). The Pd coating obtained at 60 ℃ is uniform and compact, and has high corrosion resistance and hydrogen permeability.
分 类 号:TQ153.19[化学工程—电化学工业]
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