Repetition rate dependence of absorption of fused silica irradiated at 193 nm  

作　　者：刘卫静 李斌成 

机构地区：[1]Institute of Optics and Electronics,Chinese Academy of Sciences [2]University of Chinese Academy of Sciences

出　　处：《Chinese Optics Letters》2013年第5期69-71,共3页中国光学快报（英文版）

摘　　要：Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in tile range of 50-1000 Hz with an ArF laser calorimeter. The ＂apparent＂ single- and two- photon absorption coefficients are determined by measuring the laser fiuence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in tile range of 50-1000 Hz with an ArF laser calorimeter. The ＂apparent＂ single- and two- photon absorption coefficients are determined by measuring the laser fiuence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

关 键 词：Two photon processes 

分 类 号：O482.3[理学—固体物理]