电沉积铁氰化镍测定多孔膜电极的电活性面积  

Electrodeposition of Nickel Hexacyanoferrate for the Estimation of the Electroactive Area in Porous Three-Dimensional Film Electrode

作　　者：马旭莉[1] 杨言言[1] 王忠德[1] 郝晓刚[1] 

机构地区：[1]太原理工大学,山西太原030024

出　　处：《稀有金属材料与工程》2013年第4期776-780,共5页Rare Metal Materials and Engineering

基　　金：国家自然科学基金(21276173);山西省自然科学基金(2012011006-1;2012011020-5)

摘　　要：采用电化学方法测定三维多孔膜电极的电活性有效表面积、活性体积和表面覆盖度。以三维多孔电极或沉积有过渡金属铁氰化镍半导体薄膜的三维多孔膜电极为工作电极,分别在含铁氰化钾和不含铁氰化钾的碱金属溶液中测定不同扫描速度下的循环伏安曲线,利用膜电极在不同溶液体系中氧化/还原反应的可逆特性测定其电活性有效表面积和覆盖度;同时结合计时库仑法获得三维多孔膜电极内膜的活性体积和平均膜厚。结果表明:该方法具有电化学反应响应快速、灵敏且精确度高的优点,操作简单且快捷方便,可靠性好。A novel electrochemical method was proposed to estimate the effective electroactive area, active volume and surface coverage of the porous three-dimensional film electrode. Nickel hexacyanoferrate （NiHCF） thin films were synthesized on the porous three-dimensional foam nickel substrate by cathodical deposition. Cyclic voltammograms of the foam nickel electrode and the NiHCF film electrode at various potential scan rates were obtained in alkali metal solution with and without K3Fe（CN）6, respectively. The effective electroactive area and the coverage of the porous three-dimensional film electrode were characterized by the reversible property of redox reaction of porous electrode in different solution systems. Combining with chronocoulometry, the active volume of the internal NiHCF film was obtained, and then the average thickness of the film was also calculated. The proposed method shows the characteristics of fast response, high sensitivity and excellent accuracy with easy operation and good reliability.

关 键 词：循环伏安 三维多孔电极 活性面积 铁氰化镍 计时库仑 

分 类 号：TB43[一般工业技术]