可调脉冲功率(MPP)磁控溅射电源研制及放电特性的研究  

Development of the modulated pulsed power(MPP) magnetron sputtering system and its discharge behavior

作　　者：魏松[1] 田修波[1] 巩春志[1] 

机构地区：[1]哈尔滨工业大学先进焊接与连接国家重点实验室,黑龙江哈尔滨150001

出　　处：《真空》2013年第3期6-9,共4页Vacuum

基　　金：国家自然科学基金(51175118和10975041)

摘　　要：可调脉冲电源MPP(modulated pulsed power)磁控溅射技术是一种新型的高功率磁控溅射技术。基于STC12C5A60S2单片机为控制单元研制了MPP电源。电源可以输出多种脉冲波形,能够实现优化的高功率脉冲磁控溅射工艺。MPP放电模式表现为初始的弱放电和随后的高功率大电流放电行为。MPP放电电压影响着高功率放电电流和脉冲宽度,而放电气压主要影响起辉时刻,但对放电电流大小影响不大。引入引燃脉冲可实现低气压下的高功率大电流放电。Modulated pulsed power （MPP） magnetron sputtering is a new kind of high power magnetron sputtering（HPPMS） technology. A contt^ol unit based on the STC12C5A60S2 chip was designed for the MPP system. It outputs multistep pulse waveforms, which can optimize high power pulsed magnetron sputtering process. In the MPP discharge mode, a high density plasma is induced by first producing a weakly ionized plasma followed by a transition to a strongly ionized plasma within one overall pulse. Discharge voltage has influence on the discharge current and pulse width, while the discharge pressure has great influence on the time of ignition and slight effect on discharge current. An additional ignition pulse may effectively lead to high power large current discharge even in low pressure.

关 键 词：高功率脉冲磁控溅射 可调脉冲电源 放电特性 单片机 

分 类 号：TB79[一般工业技术—真空技术]