电沉积制备Co-Pt-Mo磁性薄膜  

Preparation of Co-Pt-Mo Magnetic Film by Electrodeposition

作　　者：王乐泰[1] 俞柯柯[1] 蒋霄云[1] 秦雨晴[1] 忻翠翠[1] 卫国英[1] 

机构地区：[1]中国计量学院材料科学与工程学院,浙江杭州310018

出　　处：《电镀与环保》2013年第3期18-20,共3页Electroplating & Pollution Control

摘　　要：通过电沉积方法在铜基底上制得Co-Pt-Mo磁性薄膜。通过对镀液的循环伏安分析,确定了合适的沉积电位。研究了pH值对薄膜的成分、表面形貌、结构以及磁性能的影响。结果表明:随着pH值的增大,薄膜中Co的质量分数从26.9%逐渐增加到63.8%,矫顽力与比饱和磁化强度分别从0.3kA/m和189kA/m增加到24.1kA/m和1 283kA/m。A Co Pt-Mo magnetic film was prepared on Cu substrate by electrodeposition. A suitable deposition potential was determined by cyclic vohammetric analysis. The influence of pH value on the composition, surface morphology, structure and magnetic performance of the film was investigated. The results show that with the increase of pH value, the mass fraction of cobalt in the Co Pt Mo film gradually increases from 26. 9 % to 63. 8 %, and the coercive force and specific saturation magnetization of the film increases from 0.3 kA/m to 24.1 kA/m, and from 189 kA/m to 1 283 kA/m respectively.

关 键 词：电沉积 磁性能 矫顽力 薄膜 

分 类 号：TQ153[化学工程—电化学工业]