偏压对类石墨非晶碳膜结构和机械性能的影响  

Effect of substrate bias voltage on structure and mechanical properties of graphite-like carbon films

作　　者：张学谦[1,2] 黄美东[1] 柯培玲 汪爱英[2] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387 [2]中国科学院宁波材料技术与工程研究所表面工程事业部,浙江宁波315201

出　　处：《天津师范大学学报（自然科学版）》2013年第2期29-33,共5页Journal of Tianjin Normal University：Natural Science Edition

基　　金：国家自然科学基金资助项目(61078059);天津师范大学创新计划资助项目(52X09038)

摘　　要：采用高功率脉冲磁控溅射法在Si和高速钢基底上制备类石墨(Graphite-like carbon,GLC)非晶碳膜,研究了基底偏压对薄膜微观结构、机械性能和摩擦学性能的影响.结果表明:随着基底偏压的增大,GLC薄膜sp2键含量先减小后增大,在基底偏压为-100 V时达到最小值;薄膜的硬度和弹性模量先增大后减小,表面粗糙度先减小后增大;GLC薄膜的摩擦学性能与其机械性能和表面粗糙度密切相关,在基底偏压为-100 V时,薄膜的平均摩擦系数最小.Graphite-like carbon （GLC） films were prepared on the substrates of silicon and high speed steel by using high power impulse magnetron sputtering （HIPIMS） technique deposition system to study the effects of substrate bias voltages on its microstructure, mechanical properties and tribological properties. The results show that the sp2 content in the film descends first and then ascends with increase of the substrate bias voltages, and reaches the minimum when the bias is -100 V. The hardness and elastic modulus ascend first and then descend, while the surface roughness descends first and then ascends. When the bias is -100 V, the hardness and elastic modulus reach the maximum and the surface roughness reaches the minimum. The tribological properties are closely related with the mechanical properties and surface roughness, and the average friction coefficient reaches the minimum when the bias is -100 V.

关 键 词：高功率脉冲磁控溅射 类石墨非晶碳膜 基底偏压 微观结构 摩擦性能 机械性能 

分 类 号：TG174.45[金属学及工艺—金属表面处理]