CdS薄膜的可见和近红外光谱性能研究  

Visible-near Infrared Spectral Transmittance Properties for CdS Films

作　　者：张传军[1,2] 丛家铭[3] 邬云骅 曹鸿[1,2] 王善力 褚君浩[1,2] 

机构地区：[1]中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083 [2]上海太阳能电池研究与发展中心,上海201201 [3]西安工业大学光电工程学院,西安710032

出　　处：《红外技术》2013年第5期259-264,共6页Infrared Technology

基　　金：中国科学院知识创新工程重要方向项目,编号:KGCX2-YW-384;上海市2012年度“科技创新行动计划”节能减排领域项目,编号:12dz1201000;中国科学院知识创新工程

摘　　要：在康宁7059玻璃衬底上采用磁控溅射、化学水浴和近空间升华法制备CdS薄膜,在FTO、ITO、AZO衬底上采用磁控溅射法制备CdS薄膜。分别对两组CdS薄膜的形貌、结构和光学性能进行了研究,结果表明:采用不同工艺和衬底条件制备的CdS薄膜具有不同的形貌和结构,并表现出不同的光学性能。对于不同的制备技术,化学水浴法制备的CdS薄膜在520～820nm范围的光谱平均透过率最高,光学带隙最大为2.418eV,磁控溅射法制备的CdS薄膜在820～1200nm和520～1200nm范围的光谱平均透过率最高。对于不同的衬底条件,在FTO衬底上磁控溅射制备的CdS薄膜在820～1200nm和520～1200nm范围的光谱平均透过率最高。CdS films are deposited on Coming 7059 glass substrate by magnetron sputtering, chemical bath deposition and close space sublimation, and CdS films are deposited by magnetron sputtering on FTO, ITO and AZO substrates. The morphology, structure and optical properties of CdS films are investigated in two groups. The results show that morphology and structure of CdS thin films are different on different preparation processes and substrates conditions, and affect the optical properties of the corresponding CdS film. For the different deposition techniques, spectrum of CdS thin films prepared by chemical bath deposition has the highest average transmittance in the 520-820 nm range, the maximum optical band gap of 2.418 eV. Spectrum of CdS thin films prepared by magnetron sputtering has the highest average transmittance in 820- 1200 nm and 520-1200 nm range. For different substrate conditions, Spectrum of CdS films prepared by magnetron sputtering has the highest average transmittance in 820- 1200 nm and 520- 1200 nm range on FTO substrate.

关 键 词：CDS薄膜 光谱透过率 可见和近红外光谱 

分 类 号：TN213[电子电信—物理电子学]