PCVD法制备Fe-6.5%Si高硅钢片的工艺研究  

Study on Fe-6.5%Si Steel Slice Prepared by PCVD

作　　者：周磊[1] 潘应君[1] 徐超[1] 彭骏松[1] 张改璐[1] 

机构地区：[1]武汉科技大学,武汉430081

出　　处：《表面技术》2013年第3期88-90,共3页Surface Technology

摘　　要：为制备Fe-6.5%Si高硅钢片,先利用PCVD技术在0.2 mm厚的纯铁片表面沉积硅,再进行高温扩散。通过正交实验分析了沉积硅的工艺参数对表层硅含量的影响,并研究了扩散参数对截面硅含量分布的影响。结果表明:以10%SiH4+90%Ar作为渗源气,在500℃下沉积20 min,所得样品的表层硅含量高达40.5%;然后在工业纯氢气的保护下,于1050℃保温60 min,可获得满足要求的Fe-6.5%Si高硅钢片。Fe-6.5 % Si high silicon steel sheet was available after silicon was deposited on the surface of plain pure steel sheet with 0.2 mm heavy through PCVD, then treated at a high temperature. Analyzed the impact of deposition process parame-ters on the surface of the silicon content by orthogonal test, the relationship between diffusion parameters and the cross-sectional distribution of silicon content was studied. The results show that 40.5% of the surface silicon is obtained by the 10% Sill4 and 90% Ar as the seepage source, 500 ℃ deposition for 20 min. Meeting the requirements of Fe-6.5% Si high silicon steel sheet is obtained in the protection of industrial pure H2 at 1050 ℃ insulating for 60 min.

关 键 词：PCVD 6 5%Si硅钢片 渗硅 扩散处理 

分 类 号：TG174.444[金属学及工艺—金属表面处理]