镀液组成对铬-金刚石复合电沉积的影响  

Influences of plating bath composition on chromium-diamond composite electrodeposition

作　　者：何湘柱[1] 黄利勇[1] 张文俊[1] 宋清[1] 

机构地区：[1]广东工业大学轻工化工学院,广东广州510006

出　　处：《电镀与涂饰》2013年第6期5-9,共5页Electroplating & Finishing

摘　　要：以紫铜片为基体,采用电沉积法在三价铬镀液中制备了铬-金刚石复合镀层。在pH=1.0、电流密度12A/dm2、搅拌速率150r/min、温度30°C及施镀时间15min的条件下,研究了镀液中主要组分的质量浓度对铬-金刚石复合镀层厚度和外观的影响,得到较好的镀液配方为:CrCl3·6H2O170g/L,HCOOK60g/L,KCl20g/L,CH3COONa·3H2O20g/L,NH4Cl60g/L,超细金刚石25g/L。采用该配方制备的Cr-金刚石复合镀层表面平整、裂纹细小,金刚石颗粒均匀镶嵌在铬镀层中,显微硬度高达1292.6HV,综合性能优于纯铬镀层。Chromium-diamond composite coating was prepared from trivalent chromium bath by electrodeposition, using pure copper sheet as substrate. The effects of mass concentration of main components in plating bath on thickness and appearance of chromium-diamond composite coating were studied under the following conditions： temperature 30 ℃, pH 1.0, current density 12 A/dm2, stirring rate 150 r/min, and plating time 15 min. The optimized bath compositions are as follows： CrC13.6H20 170 g/L, HCOOK 60 g/L, KC120 g/L, CH3COONa.3H20 20 g/L, NH4C160 g/L, and ultrafine diamond 25 g/L. The surface of Cr-diamond composite coating prepared from the given plating bath is smooth and has tiny cracks, with diamond particles uniformly embedded in chromium metal coating. The composite coating has a microhardness up to 1 292.6 HV, and shows better comprehensive performance than pure chromium coating.

关 键 词：铬 金刚石 复合电镀 镀液组成 厚度 外观 

分 类 号：TQ153.11[化学工程—电化学工业]