喷涂粒子飞行路径的高速摄像分析及计算模拟  

High-speed camera analysis and computational simulation for flight path of spraying particle

作　　者：李德元[1] 张晶[1] 李篪[2] 韩海玲[3] 谢天男[1] 王晓宇[1] 

机构地区：[1]沈阳工业大学材料科学与工程学院,沈阳110870 [2]沈阳理工大学现代教育技术中心,沈阳110159 [3]辽宁省交通高等专科学校机电系,沈阳110122

出　　处：《沈阳工业大学学报》2013年第3期268-273,共6页Journal of Shenyang University of Technology

基　　金：沈阳市科技攻关资助项目(F10-011-2-00)

摘　　要：为了满足采用等离子喷涂时获得最佳喷涂质量的要求,利用高速摄像系统对等离子喷涂过程中粒子的飞行路径进行拍摄,将得到的图片进行分析研究,得到粒子的运动速度和轨迹,与计算模拟结果相对比,以确定最优化的喷涂工艺参数.结果表明:随着喷涂电流的增加,喷涂粒子的速度升高;而随着喷涂主气流量的降低,喷涂粒子的速度有所下降.图片分析结果与计算结果相符合,为选择等离子喷涂的最佳工艺参数和获得高质量的涂层提供了理论依据.In order to meet the requirement in obtaining the best spraying quality during the plasma spraying process, the flight path of particles during the plasma spraying process was shot with a high-speed camera system. The obtained pictures were studied and analyzed to get the motion velocity and trajectory of particles which were compared with the computational simulation results, and thus, the optimal technological parameters of spraying process were determined. The results show that with increasing the spraying current, the velocity of spraying particles increases. With decreasing the main gas flow rate for spraying, the velocity of spraying particles decreases. The results of image analysis are consistent with the computed results. It provides the theoretical basis for selecting the optimal technological parameters of plasma spraying and attaining the coating with high quality.

关 键 词：等离子喷涂 计算 模拟 喷涂粒子 主气流量 飞行路径 射流 高速摄像 喷涂工艺 

分 类 号：TG174.442[金属学及工艺—金属表面处理]