基于双曲面基底微透镜阵列的半导体激光器整形系统设计  

Design of Semiconductor Laser Shaping System Based on Hyperbola Substrate Microlens Array

作　　者：殷智勇[1,2] 汪岳峰[1] 尹韶云 强继平[1] 雷呈强[1] 孙秀辉 杨凯[1] 

机构地区：[1]军械工程学院电子与光学工程系,河北石家庄050003 [2]重庆绿色智能技术研究院微纳制造与系统集成中心,重庆401122

出　　处：《中国激光》2013年第6期120-125,共6页Chinese Journal of Lasers

摘　　要：为了进一步提高半导体激光器整形系统的能量传输效率,提出了基于双曲面基底微透镜阵列的半导体激光器堆栈光束整形系统。双曲面基底微透镜阵列可以同时实现光束的准直与分束双重功能,减少了系统中光学表面的使用量。运用远心光路设计了半导体激光器光束慢轴准直透镜以满足微透镜小视场的要求。通过ZEMAX软件进行仿真,验证了双曲面基底微透镜阵列半导体激光器整形系统的可行性,并获得了30mm×15mm的、不均匀性小于7%的光斑,系统能量传输效率达到96%。To further improve the energy transfer efficiency of the semiconductor laser shaping system, a semiconductor laser shaping system based on hyperbola substrate microlens array is proposed. Semiconductor laser beam collimation and splitting can be simultaneously achieved by this microlens array, as a result the number of optical surface is reduced. Slow axis collimated lens of semiconductor laser is designed with the use of telecentric optical path so as to meet the small field requirement of microlens. With the simulation result in ZEMAX, the feasibility of the semiconductor laser shaping system based on hyperbola substrate microlens array is verified. A 30 mm×l5 mm irradiance area is obtained with the unhomogeneity of less than 7%, and the energy transfer efficiency of the system reaches 96 %.

关 键 词：光学设计 微透镜阵列 高斯光束 光斑均匀性 功率密度 

分 类 号：TN245[电子电信—物理电子学]